ETEL's XYZT Planar Platform is now available in North America through HEIDENHAIN Corporation. "The XYZT Planar Platform is a reliable stage with more than 100 units currently in the field worldwide," said a company spokesperson. "This system provides excellent dynamic flatness and bi-directional repeatability, making it suitable for a wide range of applications."
The XYZT Planar Platform is a hybrid mechanical/air bearing stage dedicated to step-and-scan applications. The stage is modular and can be outfitted with the components best suited to each individual application. Due to the flexibility of the platform, it has been used in wafer process control applications such as Critical Dimension and Thin Film Metrology, as well as in Wafer Scribing and Wafer Laser Thermal Annealing.
"The hybrid nature of the XYZT Planar Platform allows the user to enjoy the best qualities of both mechanical and air bearings," said the spokesperson. "The mechanical bearings provide high stiffness in the XY plane, allowing for high accelerations (up to 1.2 g) and great bi-directional repeatability (+/-0.5 um for the X- and Y-axes). Due to the air bearing, the platform is also able to provide excellent dynamic flatness over the full range of travel."
The standard XYZT Planar Platform mounts an ETEL ZT Combined Module on the gantry beam of the XY stage. The ZT Combined Module provides infinite Theta rotation and dual Z-axes: a coarse Z-axis for wafer loading and unloading and a fine Z-axis for focus adjustment. "This module can be replaced to best suit the needs of an application, whether that application requires only Z motion, pure Theta motion or ZT motion with tip/tilt correction," said the spokesperson. "The stroke of the X- and Y-axes can be adjusted to accommodate a 300 mm or 450 mm wafer, and even longer strokes are also available. The platform can also be integrated with ETEL's QuiET Active Isolation System to further improve system performance."
Advantages offered by the ETEL XYZT Planar Platform also include the following:
- Built-in vacuum supply at chuck level
- Compact footprint
- ISO2 clean room compatibility
- Position stability of +/-25 nm for X- and Y-axes, +/-15 nm for Z-axis, and +/-0.2 arcsec for T-axis
- Bi-directional repeatability of +/-0.3 um for Z-axis and +/-2 arcsec for T-axis.
Detailed information is available at www.etel.ch/motion-systems/planar-platforms/.
For more information contact:
ETEL S.A.
Zone Industrielle
CH-2112 Motiers
Switzerland
+41 (0)32-862-0100
www.etelusa.com
Mark Skaer
ETEL Systems Product Specialist
HEIDENHAIN Corporation
333 E. State Parkway
Schaumburg, IL 60173-5337
847-490-7812 / 847-490-1191
mskaer@heidenhain.com
www.heidenhain.us