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February 2020

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Call for Papers 2020 Coordinate Metrology Society Conference

The Coordinate Metrology Society (CMS) has announced the official call for technical papers for its Coordinate Metrology Society Conference (CMSC) to be held July 20-24, 2020, in New Orleans, LA.

In its 36th year, the CMS will again host an interactive educational conference for novice and expert users of portable and stationary measurement solutions. For the first time, abstract submissions will be accepted from experts working in the traditional CMM field, in addition to master practitioners from the portable metrology discipline. Commercial content is not accepted. The CMS community convenes each year to learn about breakthroughs in measurement technologies and emerging trends impacting manufacturing, scientific research and data-driven quality platforms. For more information, visit CMSC Call for Papers at

High Level Metrology Topics

The CMS conference is designed to provide attendees with thought-provoking technical presentations and open discussions of advancements in 3D metrology applications. Subject matter experts and expert teams are encouraged to submit abstracts covering original research, best practices, technology benchmarks, successful implementations, data-driven Smart Factory trends and metrology-assisted competencies gained in automation, process control and assembly. Overall, the CMSC delivers an inclusive knowledge platform to engage professionals at different skill levels, as metrology continues to impact the entire manufacturing landscape.

Abstract Submission Date and More         

Authors have until March 6, 2020, to submit their abstracts to the CMS. The CMSC is a selective conference and each abstract is rigorously peer-reviewed by the CMS Executive Committee. Abstracts must describe original, unpublished research or relevant case uses pertaining to the portable and stationary metrology field at large. If an abstract is accepted, the author will receive a Notification of Acceptance on April 3, 2020. CMS membership fees and conference registration fees are waived for accepted individual speakers. If a technical paper has more than one author, the CMS will waive one conference registration and membership fee. For more information, contact the CMS Technical Presentations Coordinators Daniel Sawyer, Scott Sandwith, or Justin Novak at The CMSC Technical Paper Guidelines document can be downloaded here. 

The Journal of CMSC and the CMS Digital Library

Directly following CMSC 2020, the CMS Executive Committee reviews, scores and selects the top technical papers for publication in the Journal of the CMSC. Since 1984, more than 525 original technical papers have been presented at the annual conference. The CMS maintains a digital library of more than 120 technical papers captured in the Journal of the CMSC publications over the past 13 years. "This is the most extensive repository of metrology knowledge and information in the world," said a CMSC spokesperson. "The archive serves as reference point and a reputable resource to support researchers in the industry. Authors are encouraged to cite CMSC technical papers if referenced in their own technical papers."

The 2019 CMSC agenda delivered a host of novel and authoritative technical papers presented during the event. Conference programming included 20 presentations covering a wide berth of topics including "How to get the Most Accuracy Out of Your PCMM", "Thickness Inspection of Composite Parts" and "Noise Filtration of 3D Scanned Data Points in Metrology of Highly Reflective Surfaces". The speaker roster covered an expansive array of leading manufacturers, academia and scientific research organizations such as Porto Performance, Spirit Aerosystems, Newport News Shipbuilding, Electroimpact, Wagstaff Inc., National Institute of Standards and Technology (NIST), National Sonar Observatory, Argonne National Laboratory, Los Alamos National Laboratory, UNC Charlotte Center for Precision Metrology, University of Ontario Institute of Technology, University College London, University of Nottingham and Shanghai Institute of Metrology and Testing Technology.

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